Abstract

A new basis is presented for the calculation of reflection coefficients of x rays by multilayer artifacts. Thin film interference is treated at an atomic plane level using an iterative 2 × 2 matrix method. Analytic and computational comparisons are made with the conventional dielectric approach for TM and TE polarizations at non-normal incidence. Good agreement is obtained with recent accurate measurements by Evans.

© 1987 Optical Society of America

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