Abstract
We present a new fabrication technique based on a two-step UV exposure lithographic process to marginally modulate the refractive index in commercial SU-8 photoresist. This technique achieves refractive index modulation as different regions undergo different thermal densification prior to UV-induced polymerization. A small refractive index contrast of 0.0008 or lower can be achieved, and this is especially useful for fabricating waveguides with a low level of propagation modes. This technique may be extended to other UV-curable epoxy photoresists and can easily be applied in the fabrication of optical elements such as optical interconnects and integrated optical sensors without the development process.
© 2006 Optical Society of America
Full Article | PDF ArticleOSA Recommended Articles
Biow Hiem Ong, Xiaocong Yuan, Shaohua Tao, and Swee Chuan Tjin
Opt. Lett. 31(10) 1367-1369 (2006)
Xi-Bin Wang, Jian Sun, Chang-Ming Chen, Xiao-Qiang Sun, Fei Wang, and Da-Ming Zhang
Opt. Mater. Express 4(3) 509-517 (2014)
Jhonattan C. Ramirez, Juliana N. Schianti, Maria G. Almeida, Aristides Pavani, Roberto R. Panepucci, Hugo E. Hernandez-Figueroa, and Lucas H. Gabrielli
Opt. Mater. Express 7(7) 2651-2659 (2017)