Abstract

We report polarization independent Bragg grating wavelength filter with high diffraction efficiency. A rib waveguide polarization rotator and antisymmetric grating structure for fundamental to first order diffraction are used to generate the polarization rotation Bragg diffraction. The diffraction efficiencies and peak wavelengths become the same for two orthogonal input polarizations. Strong diffraction is attained easily. The concept was verified by simulation and experiment. Polarization independent band-pass filter consisting of polarization beam splitter and polarization rotation Bragg diffraction was experimentally demonstrated.

© 2015 Optical Society of America

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References

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  1. T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonic devices based on silicon micro fabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
    [Crossref]
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    [Crossref]
  4. H. Okayama, K. Kotani, Y. Maeno, D. Shimura, H. Yaegashi, and Y. Ogawa, “Design of polarization-independent Si-wire-waveguide wavelength demultiplexer for optical network unit,” Jpn. J. Appl. Phys. 49(4), 04DG19 (2010).
    [Crossref]
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    [Crossref]
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    [Crossref]
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    [Crossref]
  14. H. Okayama, Y. Onawa, H. Sasaki, and H. Yaegashi, “Study of first order mode diffraction in Si wire waveguide polarization rotation Bragg grating,” in Tech. Digest Spring Conv. Jpn. Soc. Appl. Phys., Kanagawa, Japan, March. 2015, paper 13a-P8–5.
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  20. H. Guan, Y. Ma, R. Shi, A. Novack, J. Tao, Q. Fang, A. E.-J. Lim, G.-Q. Lo, T. Baehr-Jones, and M. Hochberg, “Ultracompact silicon-on-insulator polarization rotator for polarization-diversified circuits,” Opt. Lett. 39(16), 4703–4706 (2014).
    [Crossref] [PubMed]
  21. H. Guan, Q. Fang, G.-Q. Lo, and K. Bergman, “High-efficiency biwavelength polarization splitter-rotator on the SOI platform,” IEEE Photonics Technol. Lett. 27(5), 518–521 (2015).
    [Crossref]
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2015 (1)

H. Guan, Q. Fang, G.-Q. Lo, and K. Bergman, “High-efficiency biwavelength polarization splitter-rotator on the SOI platform,” IEEE Photonics Technol. Lett. 27(5), 518–521 (2015).
[Crossref]

2014 (3)

2013 (1)

2012 (3)

2011 (2)

L. Liu, Y. Ding, K. Yvind, and J. M. Hvam, “Efficient and compact TE-TM polarization converter built on silicon-on-insulator platform with a simple fabrication process,” Opt. Lett. 36(7), 1059–1061 (2011).
[Crossref] [PubMed]

X. Wang, W. Shi, R. Vafaei, A. F. Jaeger, and L. Chrostowski, “Uniform and sampled Bragg gratings in SOI strip waveguides with sidewall corrugations,” IEEE Photonics Technol. Lett. 23(5), 290–292 (2011).

2010 (2)

W. Bogaerts, S. K. Selvaraja, P. Dumon, J. Brouckaert, K. De Vos, D. Van Thourhout, and R. Baets, “Silicon-on-insulator spectral filters fabricated with CMOS technology,” IEEE J. Sel. Top. Quantum Electron. 16(1), 33–44 (2010).
[Crossref]

H. Okayama, K. Kotani, Y. Maeno, D. Shimura, H. Yaegashi, and Y. Ogawa, “Design of polarization-independent Si-wire-waveguide wavelength demultiplexer for optical network unit,” Jpn. J. Appl. Phys. 49(4), 04DG19 (2010).
[Crossref]

2009 (1)

2008 (2)

2006 (1)

H. Yamada, T. Chu, S. Ishida, and Y. Arakawa, “Si photonic wire waveguide devices,” IEEE J. Sel. Top. Quantum Electron. 12(6), 1371–1379 (2006).
[Crossref]

2005 (2)

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonic devices based on silicon micro fabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

M. R. Watts and H. A. Haus, “Integrated mode-evolution-based polarization rotators,” Opt. Lett. 30(2), 138–140 (2005).
[Crossref] [PubMed]

2001 (1)

Arakawa, Y.

H. Yamada, T. Chu, S. Ishida, and Y. Arakawa, “Si photonic wire waveguide devices,” IEEE J. Sel. Top. Quantum Electron. 12(6), 1371–1379 (2006).
[Crossref]

Baehr-Jones, T.

Baets, R.

W. Bogaerts, S. K. Selvaraja, P. Dumon, J. Brouckaert, K. De Vos, D. Van Thourhout, and R. Baets, “Silicon-on-insulator spectral filters fabricated with CMOS technology,” IEEE J. Sel. Top. Quantum Electron. 16(1), 33–44 (2010).
[Crossref]

Bergman, K.

H. Guan, Q. Fang, G.-Q. Lo, and K. Bergman, “High-efficiency biwavelength polarization splitter-rotator on the SOI platform,” IEEE Photonics Technol. Lett. 27(5), 518–521 (2015).
[Crossref]

Bogaerts, W.

W. Bogaerts, S. K. Selvaraja, P. Dumon, J. Brouckaert, K. De Vos, D. Van Thourhout, and R. Baets, “Silicon-on-insulator spectral filters fabricated with CMOS technology,” IEEE J. Sel. Top. Quantum Electron. 16(1), 33–44 (2010).
[Crossref]

Bowers, J. E.

Brouckaert, J.

W. Bogaerts, S. K. Selvaraja, P. Dumon, J. Brouckaert, K. De Vos, D. Van Thourhout, and R. Baets, “Silicon-on-insulator spectral filters fabricated with CMOS technology,” IEEE J. Sel. Top. Quantum Electron. 16(1), 33–44 (2010).
[Crossref]

Chrostowski, L.

Chu, T.

H. Yamada, T. Chu, S. Ishida, and Y. Arakawa, “Si photonic wire waveguide devices,” IEEE J. Sel. Top. Quantum Electron. 12(6), 1371–1379 (2006).
[Crossref]

Dai, D.

De Vos, K.

W. Bogaerts, S. K. Selvaraja, P. Dumon, J. Brouckaert, K. De Vos, D. Van Thourhout, and R. Baets, “Silicon-on-insulator spectral filters fabricated with CMOS technology,” IEEE J. Sel. Top. Quantum Electron. 16(1), 33–44 (2010).
[Crossref]

Ding, Y.

Dumon, P.

W. Bogaerts, S. K. Selvaraja, P. Dumon, J. Brouckaert, K. De Vos, D. Van Thourhout, and R. Baets, “Silicon-on-insulator spectral filters fabricated with CMOS technology,” IEEE J. Sel. Top. Quantum Electron. 16(1), 33–44 (2010).
[Crossref]

Fainman, Y.

Fang, Q.

H. Guan, Q. Fang, G.-Q. Lo, and K. Bergman, “High-efficiency biwavelength polarization splitter-rotator on the SOI platform,” IEEE Photonics Technol. Lett. 27(5), 518–521 (2015).
[Crossref]

H. Guan, Y. Ma, R. Shi, A. Novack, J. Tao, Q. Fang, A. E.-J. Lim, G.-Q. Lo, T. Baehr-Jones, and M. Hochberg, “Ultracompact silicon-on-insulator polarization rotator for polarization-diversified circuits,” Opt. Lett. 39(16), 4703–4706 (2014).
[Crossref] [PubMed]

Fard, S. T.

Flueckiger, J.

Fukuda, H.

Greenberg, M.

Grist, S.

Guan, H.

H. Guan, Q. Fang, G.-Q. Lo, and K. Bergman, “High-efficiency biwavelength polarization splitter-rotator on the SOI platform,” IEEE Photonics Technol. Lett. 27(5), 518–521 (2015).
[Crossref]

H. Guan, Y. Ma, R. Shi, A. Novack, J. Tao, Q. Fang, A. E.-J. Lim, G.-Q. Lo, T. Baehr-Jones, and M. Hochberg, “Ultracompact silicon-on-insulator polarization rotator for polarization-diversified circuits,” Opt. Lett. 39(16), 4703–4706 (2014).
[Crossref] [PubMed]

Hastings, J. T.

Haus, H. A.

Hayama, Y.

Hochberg, M.

Hvam, J. M.

Ikeda, K.

Ishida, S.

H. Yamada, T. Chu, S. Ishida, and Y. Arakawa, “Si photonic wire waveguide devices,” IEEE J. Sel. Top. Quantum Electron. 12(6), 1371–1379 (2006).
[Crossref]

Itabashi, S.

Jaeger, A. F.

X. Wang, W. Shi, R. Vafaei, A. F. Jaeger, and L. Chrostowski, “Uniform and sampled Bragg gratings in SOI strip waveguides with sidewall corrugations,” IEEE Photonics Technol. Lett. 23(5), 290–292 (2011).

Jaeger, N. A. F.

Kato, A.

Kotani, K.

H. Okayama, K. Kotani, Y. Maeno, D. Shimura, H. Yaegashi, and Y. Ogawa, “Design of polarization-independent Si-wire-waveguide wavelength demultiplexer for optical network unit,” Jpn. J. Appl. Phys. 49(4), 04DG19 (2010).
[Crossref]

Lim, A. E.-J.

Lin, C.

Liu, L.

Lo, G.-Q.

H. Guan, Q. Fang, G.-Q. Lo, and K. Bergman, “High-efficiency biwavelength polarization splitter-rotator on the SOI platform,” IEEE Photonics Technol. Lett. 27(5), 518–521 (2015).
[Crossref]

H. Guan, Y. Ma, R. Shi, A. Novack, J. Tao, Q. Fang, A. E.-J. Lim, G.-Q. Lo, T. Baehr-Jones, and M. Hochberg, “Ultracompact silicon-on-insulator polarization rotator for polarization-diversified circuits,” Opt. Lett. 39(16), 4703–4706 (2014).
[Crossref] [PubMed]

Ma, Y.

Maeno, Y.

H. Okayama, K. Kotani, Y. Maeno, D. Shimura, H. Yaegashi, and Y. Ogawa, “Design of polarization-independent Si-wire-waveguide wavelength demultiplexer for optical network unit,” Jpn. J. Appl. Phys. 49(4), 04DG19 (2010).
[Crossref]

Miyamura, S.

H. Okayama, Y. Onawa, D. Shimura, H. Takahashi, S. Miyamura, H. Yaegashi, and H. Sasaki, “Si wire waveguide polarisation-independent wavelength filter using polarisation rotation Bragg grating,” Electron. Lett. 50(20), 1477–1479 (2014).
[Crossref]

Y. Onawa, H. Okayama, D. Shimura, S. Miyamura, H. Yaegashi, and H. Sasaki, “Polarization-insensitive Si wire waveguide add/drop wavelength filter using reflective mode conversion grating and mode split coupler,” Electron. Lett. 48(20), 1297–1298 (2012).
[Crossref]

Morita, H.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonic devices based on silicon micro fabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

Murphy, T. E.

Nakatsuhara, K.

Novack, A.

Ogawa, Y.

H. Okayama, K. Kotani, Y. Maeno, D. Shimura, H. Yaegashi, and Y. Ogawa, “Design of polarization-independent Si-wire-waveguide wavelength demultiplexer for optical network unit,” Jpn. J. Appl. Phys. 49(4), 04DG19 (2010).
[Crossref]

Okayama, H.

H. Okayama, Y. Onawa, D. Shimura, H. Takahashi, S. Miyamura, H. Yaegashi, and H. Sasaki, “Si wire waveguide polarisation-independent wavelength filter using polarisation rotation Bragg grating,” Electron. Lett. 50(20), 1477–1479 (2014).
[Crossref]

Y. Onawa, H. Okayama, D. Shimura, S. Miyamura, H. Yaegashi, and H. Sasaki, “Polarization-insensitive Si wire waveguide add/drop wavelength filter using reflective mode conversion grating and mode split coupler,” Electron. Lett. 48(20), 1297–1298 (2012).
[Crossref]

H. Okayama, K. Kotani, Y. Maeno, D. Shimura, H. Yaegashi, and Y. Ogawa, “Design of polarization-independent Si-wire-waveguide wavelength demultiplexer for optical network unit,” Jpn. J. Appl. Phys. 49(4), 04DG19 (2010).
[Crossref]

Onawa, Y.

H. Okayama, Y. Onawa, D. Shimura, H. Takahashi, S. Miyamura, H. Yaegashi, and H. Sasaki, “Si wire waveguide polarisation-independent wavelength filter using polarisation rotation Bragg grating,” Electron. Lett. 50(20), 1477–1479 (2014).
[Crossref]

Y. Onawa, H. Okayama, D. Shimura, S. Miyamura, H. Yaegashi, and H. Sasaki, “Polarization-insensitive Si wire waveguide add/drop wavelength filter using reflective mode conversion grating and mode split coupler,” Electron. Lett. 48(20), 1297–1298 (2012).
[Crossref]

Sasaki, H.

H. Okayama, Y. Onawa, D. Shimura, H. Takahashi, S. Miyamura, H. Yaegashi, and H. Sasaki, “Si wire waveguide polarisation-independent wavelength filter using polarisation rotation Bragg grating,” Electron. Lett. 50(20), 1477–1479 (2014).
[Crossref]

Y. Onawa, H. Okayama, D. Shimura, S. Miyamura, H. Yaegashi, and H. Sasaki, “Polarization-insensitive Si wire waveguide add/drop wavelength filter using reflective mode conversion grating and mode split coupler,” Electron. Lett. 48(20), 1297–1298 (2012).
[Crossref]

Selvaraja, S. K.

W. Bogaerts, S. K. Selvaraja, P. Dumon, J. Brouckaert, K. De Vos, D. Van Thourhout, and R. Baets, “Silicon-on-insulator spectral filters fabricated with CMOS technology,” IEEE J. Sel. Top. Quantum Electron. 16(1), 33–44 (2010).
[Crossref]

Shi, R.

Shi, W.

Shimura, D.

H. Okayama, Y. Onawa, D. Shimura, H. Takahashi, S. Miyamura, H. Yaegashi, and H. Sasaki, “Si wire waveguide polarisation-independent wavelength filter using polarisation rotation Bragg grating,” Electron. Lett. 50(20), 1477–1479 (2014).
[Crossref]

Y. Onawa, H. Okayama, D. Shimura, S. Miyamura, H. Yaegashi, and H. Sasaki, “Polarization-insensitive Si wire waveguide add/drop wavelength filter using reflective mode conversion grating and mode split coupler,” Electron. Lett. 48(20), 1297–1298 (2012).
[Crossref]

H. Okayama, K. Kotani, Y. Maeno, D. Shimura, H. Yaegashi, and Y. Ogawa, “Design of polarization-independent Si-wire-waveguide wavelength demultiplexer for optical network unit,” Jpn. J. Appl. Phys. 49(4), 04DG19 (2010).
[Crossref]

Shinojima, H.

Shoji, T.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonic devices based on silicon micro fabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

Smith, H. I.

Takahashi, H.

H. Okayama, Y. Onawa, D. Shimura, H. Takahashi, S. Miyamura, H. Yaegashi, and H. Sasaki, “Si wire waveguide polarisation-independent wavelength filter using polarisation rotation Bragg grating,” Electron. Lett. 50(20), 1477–1479 (2014).
[Crossref]

Takahashi, J.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonic devices based on silicon micro fabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

Takahashi, M.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonic devices based on silicon micro fabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

Tamechika, E.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonic devices based on silicon micro fabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

Tan, D. T. H.

Tang, Y.

Tao, J.

Tsuchizawa, T.

Vafaei, R.

X. Wang, W. Shi, R. Vafaei, A. F. Jaeger, and L. Chrostowski, “Uniform and sampled Bragg gratings in SOI strip waveguides with sidewall corrugations,” IEEE Photonics Technol. Lett. 23(5), 290–292 (2011).

Van Thourhout, D.

W. Bogaerts, S. K. Selvaraja, P. Dumon, J. Brouckaert, K. De Vos, D. Van Thourhout, and R. Baets, “Silicon-on-insulator spectral filters fabricated with CMOS technology,” IEEE J. Sel. Top. Quantum Electron. 16(1), 33–44 (2010).
[Crossref]

Wang, X.

Wang, Y.

Watanabe, T.

Watts, M. R.

Yaegashi, H.

H. Okayama, Y. Onawa, D. Shimura, H. Takahashi, S. Miyamura, H. Yaegashi, and H. Sasaki, “Si wire waveguide polarisation-independent wavelength filter using polarisation rotation Bragg grating,” Electron. Lett. 50(20), 1477–1479 (2014).
[Crossref]

Y. Onawa, H. Okayama, D. Shimura, S. Miyamura, H. Yaegashi, and H. Sasaki, “Polarization-insensitive Si wire waveguide add/drop wavelength filter using reflective mode conversion grating and mode split coupler,” Electron. Lett. 48(20), 1297–1298 (2012).
[Crossref]

H. Okayama, K. Kotani, Y. Maeno, D. Shimura, H. Yaegashi, and Y. Ogawa, “Design of polarization-independent Si-wire-waveguide wavelength demultiplexer for optical network unit,” Jpn. J. Appl. Phys. 49(4), 04DG19 (2010).
[Crossref]

Yamada, H.

H. Yamada, T. Chu, S. Ishida, and Y. Arakawa, “Si photonic wire waveguide devices,” IEEE J. Sel. Top. Quantum Electron. 12(6), 1371–1379 (2006).
[Crossref]

Yamada, K.

Yun, H.

Yvind, K.

Electron. Lett. (2)

Y. Onawa, H. Okayama, D. Shimura, S. Miyamura, H. Yaegashi, and H. Sasaki, “Polarization-insensitive Si wire waveguide add/drop wavelength filter using reflective mode conversion grating and mode split coupler,” Electron. Lett. 48(20), 1297–1298 (2012).
[Crossref]

H. Okayama, Y. Onawa, D. Shimura, H. Takahashi, S. Miyamura, H. Yaegashi, and H. Sasaki, “Si wire waveguide polarisation-independent wavelength filter using polarisation rotation Bragg grating,” Electron. Lett. 50(20), 1477–1479 (2014).
[Crossref]

IEEE J. Sel. Top. Quantum Electron. (3)

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonic devices based on silicon micro fabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

H. Yamada, T. Chu, S. Ishida, and Y. Arakawa, “Si photonic wire waveguide devices,” IEEE J. Sel. Top. Quantum Electron. 12(6), 1371–1379 (2006).
[Crossref]

W. Bogaerts, S. K. Selvaraja, P. Dumon, J. Brouckaert, K. De Vos, D. Van Thourhout, and R. Baets, “Silicon-on-insulator spectral filters fabricated with CMOS technology,” IEEE J. Sel. Top. Quantum Electron. 16(1), 33–44 (2010).
[Crossref]

IEEE Photonics Technol. Lett. (2)

H. Guan, Q. Fang, G.-Q. Lo, and K. Bergman, “High-efficiency biwavelength polarization splitter-rotator on the SOI platform,” IEEE Photonics Technol. Lett. 27(5), 518–521 (2015).
[Crossref]

X. Wang, W. Shi, R. Vafaei, A. F. Jaeger, and L. Chrostowski, “Uniform and sampled Bragg gratings in SOI strip waveguides with sidewall corrugations,” IEEE Photonics Technol. Lett. 23(5), 290–292 (2011).

J. Lightwave Technol. (1)

Jpn. J. Appl. Phys. (1)

H. Okayama, K. Kotani, Y. Maeno, D. Shimura, H. Yaegashi, and Y. Ogawa, “Design of polarization-independent Si-wire-waveguide wavelength demultiplexer for optical network unit,” Jpn. J. Appl. Phys. 49(4), 04DG19 (2010).
[Crossref]

Opt. Express (6)

Opt. Lett. (4)

Other (3)

H. Okayama, Y. Onawa, H. Sasaki, and H. Yaegashi, “Study of first order mode diffraction in Si wire waveguide polarization rotation Bragg grating,” in Tech. Digest Spring Conv. Jpn. Soc. Appl. Phys., Kanagawa, Japan, March. 2015, paper 13a-P8–5.

H. Okayama, H. Yaegashi, H. Sasaki, H. Nishi, and K. Yamada, “Conversion of two polarizations into different order single polarization modes using slanted sidewall silicon wire waveguide and its application to polarization independent wavelength filtering,” in Tech. Digest 18th MOC, Tokyo, Japan, October. 2013, paper H48.

H. Okayama, Y. Onawa, D. Shimura, H. Takahashi, S. Miyamura, H. Yaegashi, and H. Sasaki, “Polarization conversion Si waveguide Bragg grating for polarization independent filter,” in IEEE International Conference on Group IV Photonics (GFP) (2014), paper ThD5.
[Crossref]

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Figures (7)

Fig. 1
Fig. 1 Device structure.
Fig. 2
Fig. 2 Polarization-rotator and grating diffraction diagram.
Fig. 3
Fig. 3 (a) Polarization rotator structure and (b) wavelength response obtained by 3D-FDTD simulation.
Fig. 4
Fig. 4 Wavelength response of grating combined with the polarization rotator (Fig. 1) obtained by 3D-FDTD simulation. The grating length is 50 μm. The waveguide width is 550 nm and corrugation depth of 150 nm is used.
Fig. 5
Fig. 5 Grating coupling coefficient as function of corrugation depth.
Fig. 6
Fig. 6 Device structure used in the experiment.
Fig. 7
Fig. 7 Measured wavelength response.

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