Abstract

We experimentally demonstrate low-loss and polarization-insensitive fiber-to-chip coupling spot-size converters (SSCs) comprised of a three dimensionally tapered Si wire waveguide, a SiON secondary waveguide, and a SiO2 spacer inserted between them. Fabricated SSCs with the SiO2 spacer exhibit fiber-to-chip coupling loss of 1.5 dB/facet for both the quasi-TE and TM modes and a small wavelength dependence in the C- and L-band regions. The SiON secondary waveguide is present only around the SSC region, which significantly suppresses the influence of the well-known N-H absorption of plasma-deposited SiON at around 1510 nm.

© 2015 Optical Society of America

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References

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  1. V. R. Almeida, R. R. Panepucci, and M. Lipson, “Nanotaper for compact mode conversion,” Opt. Lett. 28(15), 1302–1304 (2003).
    [Crossref] [PubMed]
  2. T. Shoji, T. Tsuchizawa, T. Watanabe, K. Yamada, and H. Morita, “Low loss mode size converter from 0.3μm square Si wire waveguides to singlemode fibres,” Electron. Lett. 38(25), 1669 (2002).
    [Crossref]
  3. M. Pu, L. Liu, H. Ou, K. Yvind, and J. M. Hvam, “Ultra-low-loss inverted taper coupler for silicon-on-insulator ridge waveguide,” Opt. Commun. 283(19), 3678–3682 (2010).
    [Crossref]
  4. N. Hatori, T. Shimizu, M. Okano, M. Ishizaka, T. Yamamoto, Y. Urino, M. Mori, T. Nakamura, and Y. Arakawa, “A hybrid integrated light source on a silicon platform using a trident spot-size converter,” J. Lightwave Technol. 32(7), 1329–1336 (2014).
    [Crossref]
  5. F. E. Doany, B. G. Lee, S. Assefa, W. M. J. Green, M. Yang, C. L. Schow, C. V. Jahnes, S. Zhang, J. Singer, V. I. Kopp, J. A. Kash, and Y. A. Vlasov, “Multichannel high-bandwidth coupling of ultradense silicon photonic waveguide array to standard-pitch fiber array,” J. Lightwave Technol. 29(4), 475–482 (2011).
    [Crossref]
  6. H. Park, S. Kim, J. Park, J. Joo, and G. Kim, “A fiber-to-chip coupler based on Si/SiON cascaded tapers for Si photonic chips,” Opt. Express 21(24), 29313–29319 (2013).
    [Crossref] [PubMed]
  7. A. Mekis, S. Gloeckner, G. Masini, A. Narasimha, T. Pinguet, S. Sahni, and P. De Dobbelaere, “A grating-coupler-enabled CMOS photonics platform,” IEEE J. Sel. Top. Quantum Electron. 17(3), 597–608 (2011).
    [Crossref]
  8. R. Takei, E. Omoda, M. Suzuki, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Ultranarrow silicon inverse taper waveguide fabricated with double-patterning photolithography for low-loss spot-size converter,” Appl. Phys. Express 5(5), 052202 (2012).
    [Crossref]
  9. R. Germann, H. W. M. Salemink, R. Beyeler, G. L. Bona, F. Horst, I. Massarek, and B. J. Offrein, “Silicon oxynitride layers for optical waveguide applications,” J. Electrochem. Soc. 147(6), 2237–2241 (2000).
    [Crossref]
  10. K. Worhoff, P. V. Lambeck, and A. Driessen, “Design, tolerance analysis, and fabrication of silicon oxynitride based planar optical waveguides for communication devices,” J. Lightwave Technol. 17(8), 1401–1407 (1999).
    [Crossref]
  11. T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
    [Crossref]
  12. G. Roelkens, P. Dumon, W. Bogaerts, D. Van Thourhout, and R. Baets, “Efficient silicon-on-insulator fiber coupler fabricated using 248-nm-deep UV lithography,” IEEE Photonics Technol. Lett. 17(12), 2613–2615 (2005).
    [Crossref]
  13. S. Sugitani, H. Matsuzaki, and T. Enoki, “Characteristics of organic film deposited by plasma-enhanced chemical-vapor deposition using a benzocyclobutene resin,” J. Vac. Sci. Technol. A 22(6), 2373–2378 (2004).
    [Crossref]
  14. A. Boltasseva and S. I. Bozhevolnyi, “Directional couplers using long-range surface plasmon polariton waveguides,” IEEE J. Sel. Top. Quantum Electron. 12(6), 1233–1241 (2006).
    [Crossref]
  15. R. Takei, M. Suzuki, E. Omoda, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Silicon knife-edge taper waveguide for ultralow-loss spot-size converter fabricated by photolithography,” Appl. Phys. Lett. 102(10), 101108 (2013).
    [Crossref]

2014 (1)

2013 (2)

H. Park, S. Kim, J. Park, J. Joo, and G. Kim, “A fiber-to-chip coupler based on Si/SiON cascaded tapers for Si photonic chips,” Opt. Express 21(24), 29313–29319 (2013).
[Crossref] [PubMed]

R. Takei, M. Suzuki, E. Omoda, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Silicon knife-edge taper waveguide for ultralow-loss spot-size converter fabricated by photolithography,” Appl. Phys. Lett. 102(10), 101108 (2013).
[Crossref]

2012 (1)

R. Takei, E. Omoda, M. Suzuki, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Ultranarrow silicon inverse taper waveguide fabricated with double-patterning photolithography for low-loss spot-size converter,” Appl. Phys. Express 5(5), 052202 (2012).
[Crossref]

2011 (2)

2010 (1)

M. Pu, L. Liu, H. Ou, K. Yvind, and J. M. Hvam, “Ultra-low-loss inverted taper coupler for silicon-on-insulator ridge waveguide,” Opt. Commun. 283(19), 3678–3682 (2010).
[Crossref]

2006 (1)

A. Boltasseva and S. I. Bozhevolnyi, “Directional couplers using long-range surface plasmon polariton waveguides,” IEEE J. Sel. Top. Quantum Electron. 12(6), 1233–1241 (2006).
[Crossref]

2005 (2)

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

G. Roelkens, P. Dumon, W. Bogaerts, D. Van Thourhout, and R. Baets, “Efficient silicon-on-insulator fiber coupler fabricated using 248-nm-deep UV lithography,” IEEE Photonics Technol. Lett. 17(12), 2613–2615 (2005).
[Crossref]

2004 (1)

S. Sugitani, H. Matsuzaki, and T. Enoki, “Characteristics of organic film deposited by plasma-enhanced chemical-vapor deposition using a benzocyclobutene resin,” J. Vac. Sci. Technol. A 22(6), 2373–2378 (2004).
[Crossref]

2003 (1)

2002 (1)

T. Shoji, T. Tsuchizawa, T. Watanabe, K. Yamada, and H. Morita, “Low loss mode size converter from 0.3μm square Si wire waveguides to singlemode fibres,” Electron. Lett. 38(25), 1669 (2002).
[Crossref]

2000 (1)

R. Germann, H. W. M. Salemink, R. Beyeler, G. L. Bona, F. Horst, I. Massarek, and B. J. Offrein, “Silicon oxynitride layers for optical waveguide applications,” J. Electrochem. Soc. 147(6), 2237–2241 (2000).
[Crossref]

1999 (1)

Almeida, V. R.

Arakawa, Y.

Assefa, S.

Baets, R.

G. Roelkens, P. Dumon, W. Bogaerts, D. Van Thourhout, and R. Baets, “Efficient silicon-on-insulator fiber coupler fabricated using 248-nm-deep UV lithography,” IEEE Photonics Technol. Lett. 17(12), 2613–2615 (2005).
[Crossref]

Beyeler, R.

R. Germann, H. W. M. Salemink, R. Beyeler, G. L. Bona, F. Horst, I. Massarek, and B. J. Offrein, “Silicon oxynitride layers for optical waveguide applications,” J. Electrochem. Soc. 147(6), 2237–2241 (2000).
[Crossref]

Bogaerts, W.

G. Roelkens, P. Dumon, W. Bogaerts, D. Van Thourhout, and R. Baets, “Efficient silicon-on-insulator fiber coupler fabricated using 248-nm-deep UV lithography,” IEEE Photonics Technol. Lett. 17(12), 2613–2615 (2005).
[Crossref]

Boltasseva, A.

A. Boltasseva and S. I. Bozhevolnyi, “Directional couplers using long-range surface plasmon polariton waveguides,” IEEE J. Sel. Top. Quantum Electron. 12(6), 1233–1241 (2006).
[Crossref]

Bona, G. L.

R. Germann, H. W. M. Salemink, R. Beyeler, G. L. Bona, F. Horst, I. Massarek, and B. J. Offrein, “Silicon oxynitride layers for optical waveguide applications,” J. Electrochem. Soc. 147(6), 2237–2241 (2000).
[Crossref]

Bozhevolnyi, S. I.

A. Boltasseva and S. I. Bozhevolnyi, “Directional couplers using long-range surface plasmon polariton waveguides,” IEEE J. Sel. Top. Quantum Electron. 12(6), 1233–1241 (2006).
[Crossref]

De Dobbelaere, P.

A. Mekis, S. Gloeckner, G. Masini, A. Narasimha, T. Pinguet, S. Sahni, and P. De Dobbelaere, “A grating-coupler-enabled CMOS photonics platform,” IEEE J. Sel. Top. Quantum Electron. 17(3), 597–608 (2011).
[Crossref]

Doany, F. E.

Driessen, A.

Dumon, P.

G. Roelkens, P. Dumon, W. Bogaerts, D. Van Thourhout, and R. Baets, “Efficient silicon-on-insulator fiber coupler fabricated using 248-nm-deep UV lithography,” IEEE Photonics Technol. Lett. 17(12), 2613–2615 (2005).
[Crossref]

Enoki, T.

S. Sugitani, H. Matsuzaki, and T. Enoki, “Characteristics of organic film deposited by plasma-enhanced chemical-vapor deposition using a benzocyclobutene resin,” J. Vac. Sci. Technol. A 22(6), 2373–2378 (2004).
[Crossref]

Fukuda, H.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

Germann, R.

R. Germann, H. W. M. Salemink, R. Beyeler, G. L. Bona, F. Horst, I. Massarek, and B. J. Offrein, “Silicon oxynitride layers for optical waveguide applications,” J. Electrochem. Soc. 147(6), 2237–2241 (2000).
[Crossref]

Gloeckner, S.

A. Mekis, S. Gloeckner, G. Masini, A. Narasimha, T. Pinguet, S. Sahni, and P. De Dobbelaere, “A grating-coupler-enabled CMOS photonics platform,” IEEE J. Sel. Top. Quantum Electron. 17(3), 597–608 (2011).
[Crossref]

Green, W. M. J.

Hatori, N.

Horst, F.

R. Germann, H. W. M. Salemink, R. Beyeler, G. L. Bona, F. Horst, I. Massarek, and B. J. Offrein, “Silicon oxynitride layers for optical waveguide applications,” J. Electrochem. Soc. 147(6), 2237–2241 (2000).
[Crossref]

Hvam, J. M.

M. Pu, L. Liu, H. Ou, K. Yvind, and J. M. Hvam, “Ultra-low-loss inverted taper coupler for silicon-on-insulator ridge waveguide,” Opt. Commun. 283(19), 3678–3682 (2010).
[Crossref]

Ishizaka, M.

Itabashi,

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

Jahnes, C. V.

Joo, J.

Jun-ichi Takahashi, M.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

Kamei, T.

R. Takei, M. Suzuki, E. Omoda, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Silicon knife-edge taper waveguide for ultralow-loss spot-size converter fabricated by photolithography,” Appl. Phys. Lett. 102(10), 101108 (2013).
[Crossref]

R. Takei, E. Omoda, M. Suzuki, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Ultranarrow silicon inverse taper waveguide fabricated with double-patterning photolithography for low-loss spot-size converter,” Appl. Phys. Express 5(5), 052202 (2012).
[Crossref]

Kash, J. A.

Kim, G.

Kim, S.

Kopp, V. I.

Lambeck, P. V.

Lee, B. G.

Lipson, M.

Liu, L.

M. Pu, L. Liu, H. Ou, K. Yvind, and J. M. Hvam, “Ultra-low-loss inverted taper coupler for silicon-on-insulator ridge waveguide,” Opt. Commun. 283(19), 3678–3682 (2010).
[Crossref]

Manako, S.

R. Takei, M. Suzuki, E. Omoda, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Silicon knife-edge taper waveguide for ultralow-loss spot-size converter fabricated by photolithography,” Appl. Phys. Lett. 102(10), 101108 (2013).
[Crossref]

R. Takei, E. Omoda, M. Suzuki, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Ultranarrow silicon inverse taper waveguide fabricated with double-patterning photolithography for low-loss spot-size converter,” Appl. Phys. Express 5(5), 052202 (2012).
[Crossref]

Masini, G.

A. Mekis, S. Gloeckner, G. Masini, A. Narasimha, T. Pinguet, S. Sahni, and P. De Dobbelaere, “A grating-coupler-enabled CMOS photonics platform,” IEEE J. Sel. Top. Quantum Electron. 17(3), 597–608 (2011).
[Crossref]

Massarek, I.

R. Germann, H. W. M. Salemink, R. Beyeler, G. L. Bona, F. Horst, I. Massarek, and B. J. Offrein, “Silicon oxynitride layers for optical waveguide applications,” J. Electrochem. Soc. 147(6), 2237–2241 (2000).
[Crossref]

Matsuzaki, H.

S. Sugitani, H. Matsuzaki, and T. Enoki, “Characteristics of organic film deposited by plasma-enhanced chemical-vapor deposition using a benzocyclobutene resin,” J. Vac. Sci. Technol. A 22(6), 2373–2378 (2004).
[Crossref]

Mekis, A.

A. Mekis, S. Gloeckner, G. Masini, A. Narasimha, T. Pinguet, S. Sahni, and P. De Dobbelaere, “A grating-coupler-enabled CMOS photonics platform,” IEEE J. Sel. Top. Quantum Electron. 17(3), 597–608 (2011).
[Crossref]

Mori, M.

N. Hatori, T. Shimizu, M. Okano, M. Ishizaka, T. Yamamoto, Y. Urino, M. Mori, T. Nakamura, and Y. Arakawa, “A hybrid integrated light source on a silicon platform using a trident spot-size converter,” J. Lightwave Technol. 32(7), 1329–1336 (2014).
[Crossref]

R. Takei, M. Suzuki, E. Omoda, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Silicon knife-edge taper waveguide for ultralow-loss spot-size converter fabricated by photolithography,” Appl. Phys. Lett. 102(10), 101108 (2013).
[Crossref]

R. Takei, E. Omoda, M. Suzuki, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Ultranarrow silicon inverse taper waveguide fabricated with double-patterning photolithography for low-loss spot-size converter,” Appl. Phys. Express 5(5), 052202 (2012).
[Crossref]

Morita, H.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

T. Shoji, T. Tsuchizawa, T. Watanabe, K. Yamada, and H. Morita, “Low loss mode size converter from 0.3μm square Si wire waveguides to singlemode fibres,” Electron. Lett. 38(25), 1669 (2002).
[Crossref]

Nakamura, T.

Narasimha, A.

A. Mekis, S. Gloeckner, G. Masini, A. Narasimha, T. Pinguet, S. Sahni, and P. De Dobbelaere, “A grating-coupler-enabled CMOS photonics platform,” IEEE J. Sel. Top. Quantum Electron. 17(3), 597–608 (2011).
[Crossref]

Offrein, B. J.

R. Germann, H. W. M. Salemink, R. Beyeler, G. L. Bona, F. Horst, I. Massarek, and B. J. Offrein, “Silicon oxynitride layers for optical waveguide applications,” J. Electrochem. Soc. 147(6), 2237–2241 (2000).
[Crossref]

Okano, M.

Omoda, E.

R. Takei, M. Suzuki, E. Omoda, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Silicon knife-edge taper waveguide for ultralow-loss spot-size converter fabricated by photolithography,” Appl. Phys. Lett. 102(10), 101108 (2013).
[Crossref]

R. Takei, E. Omoda, M. Suzuki, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Ultranarrow silicon inverse taper waveguide fabricated with double-patterning photolithography for low-loss spot-size converter,” Appl. Phys. Express 5(5), 052202 (2012).
[Crossref]

Ou, H.

M. Pu, L. Liu, H. Ou, K. Yvind, and J. M. Hvam, “Ultra-low-loss inverted taper coupler for silicon-on-insulator ridge waveguide,” Opt. Commun. 283(19), 3678–3682 (2010).
[Crossref]

Panepucci, R. R.

Park, H.

Park, J.

Pinguet, T.

A. Mekis, S. Gloeckner, G. Masini, A. Narasimha, T. Pinguet, S. Sahni, and P. De Dobbelaere, “A grating-coupler-enabled CMOS photonics platform,” IEEE J. Sel. Top. Quantum Electron. 17(3), 597–608 (2011).
[Crossref]

Pu, M.

M. Pu, L. Liu, H. Ou, K. Yvind, and J. M. Hvam, “Ultra-low-loss inverted taper coupler for silicon-on-insulator ridge waveguide,” Opt. Commun. 283(19), 3678–3682 (2010).
[Crossref]

Roelkens, G.

G. Roelkens, P. Dumon, W. Bogaerts, D. Van Thourhout, and R. Baets, “Efficient silicon-on-insulator fiber coupler fabricated using 248-nm-deep UV lithography,” IEEE Photonics Technol. Lett. 17(12), 2613–2615 (2005).
[Crossref]

Sahni, S.

A. Mekis, S. Gloeckner, G. Masini, A. Narasimha, T. Pinguet, S. Sahni, and P. De Dobbelaere, “A grating-coupler-enabled CMOS photonics platform,” IEEE J. Sel. Top. Quantum Electron. 17(3), 597–608 (2011).
[Crossref]

Sakakibara, Y.

R. Takei, M. Suzuki, E. Omoda, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Silicon knife-edge taper waveguide for ultralow-loss spot-size converter fabricated by photolithography,” Appl. Phys. Lett. 102(10), 101108 (2013).
[Crossref]

R. Takei, E. Omoda, M. Suzuki, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Ultranarrow silicon inverse taper waveguide fabricated with double-patterning photolithography for low-loss spot-size converter,” Appl. Phys. Express 5(5), 052202 (2012).
[Crossref]

Salemink, H. W. M.

R. Germann, H. W. M. Salemink, R. Beyeler, G. L. Bona, F. Horst, I. Massarek, and B. J. Offrein, “Silicon oxynitride layers for optical waveguide applications,” J. Electrochem. Soc. 147(6), 2237–2241 (2000).
[Crossref]

Schow, C. L.

Shimizu, T.

Shoji, E.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

Shoji, T.

T. Shoji, T. Tsuchizawa, T. Watanabe, K. Yamada, and H. Morita, “Low loss mode size converter from 0.3μm square Si wire waveguides to singlemode fibres,” Electron. Lett. 38(25), 1669 (2002).
[Crossref]

Singer, J.

Sugitani, S.

S. Sugitani, H. Matsuzaki, and T. Enoki, “Characteristics of organic film deposited by plasma-enhanced chemical-vapor deposition using a benzocyclobutene resin,” J. Vac. Sci. Technol. A 22(6), 2373–2378 (2004).
[Crossref]

Suzuki, M.

R. Takei, M. Suzuki, E. Omoda, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Silicon knife-edge taper waveguide for ultralow-loss spot-size converter fabricated by photolithography,” Appl. Phys. Lett. 102(10), 101108 (2013).
[Crossref]

R. Takei, E. Omoda, M. Suzuki, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Ultranarrow silicon inverse taper waveguide fabricated with double-patterning photolithography for low-loss spot-size converter,” Appl. Phys. Express 5(5), 052202 (2012).
[Crossref]

Takahashi, T.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

Takei, R.

R. Takei, M. Suzuki, E. Omoda, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Silicon knife-edge taper waveguide for ultralow-loss spot-size converter fabricated by photolithography,” Appl. Phys. Lett. 102(10), 101108 (2013).
[Crossref]

R. Takei, E. Omoda, M. Suzuki, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Ultranarrow silicon inverse taper waveguide fabricated with double-patterning photolithography for low-loss spot-size converter,” Appl. Phys. Express 5(5), 052202 (2012).
[Crossref]

Tamechika, S.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

Tsuchizawa, T.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

T. Shoji, T. Tsuchizawa, T. Watanabe, K. Yamada, and H. Morita, “Low loss mode size converter from 0.3μm square Si wire waveguides to singlemode fibres,” Electron. Lett. 38(25), 1669 (2002).
[Crossref]

Urino, Y.

Van Thourhout, D.

G. Roelkens, P. Dumon, W. Bogaerts, D. Van Thourhout, and R. Baets, “Efficient silicon-on-insulator fiber coupler fabricated using 248-nm-deep UV lithography,” IEEE Photonics Technol. Lett. 17(12), 2613–2615 (2005).
[Crossref]

Vlasov, Y. A.

Watanabe, T.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

T. Shoji, T. Tsuchizawa, T. Watanabe, K. Yamada, and H. Morita, “Low loss mode size converter from 0.3μm square Si wire waveguides to singlemode fibres,” Electron. Lett. 38(25), 1669 (2002).
[Crossref]

Worhoff, K.

Yamada, K.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

T. Shoji, T. Tsuchizawa, T. Watanabe, K. Yamada, and H. Morita, “Low loss mode size converter from 0.3μm square Si wire waveguides to singlemode fibres,” Electron. Lett. 38(25), 1669 (2002).
[Crossref]

Yamamoto, T.

Yang, M.

Yvind, K.

M. Pu, L. Liu, H. Ou, K. Yvind, and J. M. Hvam, “Ultra-low-loss inverted taper coupler for silicon-on-insulator ridge waveguide,” Opt. Commun. 283(19), 3678–3682 (2010).
[Crossref]

Zhang, S.

Appl. Phys. Express (1)

R. Takei, E. Omoda, M. Suzuki, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Ultranarrow silicon inverse taper waveguide fabricated with double-patterning photolithography for low-loss spot-size converter,” Appl. Phys. Express 5(5), 052202 (2012).
[Crossref]

Appl. Phys. Lett. (1)

R. Takei, M. Suzuki, E. Omoda, S. Manako, T. Kamei, M. Mori, and Y. Sakakibara, “Silicon knife-edge taper waveguide for ultralow-loss spot-size converter fabricated by photolithography,” Appl. Phys. Lett. 102(10), 101108 (2013).
[Crossref]

Electron. Lett. (1)

T. Shoji, T. Tsuchizawa, T. Watanabe, K. Yamada, and H. Morita, “Low loss mode size converter from 0.3μm square Si wire waveguides to singlemode fibres,” Electron. Lett. 38(25), 1669 (2002).
[Crossref]

IEEE J. Sel. Top. Quantum Electron. (3)

A. Mekis, S. Gloeckner, G. Masini, A. Narasimha, T. Pinguet, S. Sahni, and P. De Dobbelaere, “A grating-coupler-enabled CMOS photonics platform,” IEEE J. Sel. Top. Quantum Electron. 17(3), 597–608 (2011).
[Crossref]

A. Boltasseva and S. I. Bozhevolnyi, “Directional couplers using long-range surface plasmon polariton waveguides,” IEEE J. Sel. Top. Quantum Electron. 12(6), 1233–1241 (2006).
[Crossref]

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, M. Jun-ichi Takahashi, T. Takahashi, E. Shoji, S. Tamechika, Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quantum Electron. 11(1), 232–240 (2005).
[Crossref]

IEEE Photonics Technol. Lett. (1)

G. Roelkens, P. Dumon, W. Bogaerts, D. Van Thourhout, and R. Baets, “Efficient silicon-on-insulator fiber coupler fabricated using 248-nm-deep UV lithography,” IEEE Photonics Technol. Lett. 17(12), 2613–2615 (2005).
[Crossref]

J. Electrochem. Soc. (1)

R. Germann, H. W. M. Salemink, R. Beyeler, G. L. Bona, F. Horst, I. Massarek, and B. J. Offrein, “Silicon oxynitride layers for optical waveguide applications,” J. Electrochem. Soc. 147(6), 2237–2241 (2000).
[Crossref]

J. Lightwave Technol. (3)

J. Vac. Sci. Technol. A (1)

S. Sugitani, H. Matsuzaki, and T. Enoki, “Characteristics of organic film deposited by plasma-enhanced chemical-vapor deposition using a benzocyclobutene resin,” J. Vac. Sci. Technol. A 22(6), 2373–2378 (2004).
[Crossref]

Opt. Commun. (1)

M. Pu, L. Liu, H. Ou, K. Yvind, and J. M. Hvam, “Ultra-low-loss inverted taper coupler for silicon-on-insulator ridge waveguide,” Opt. Commun. 283(19), 3678–3682 (2010).
[Crossref]

Opt. Express (1)

Opt. Lett. (1)

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Figures (5)

Fig. 1
Fig. 1 Schematic drawing of (a) SSC with a SiO2 spacer that we propose and (b) conventional SSC without a SiO2 spacer. Both SSCs are comprised of Si taper waveguide and SiON secondary waveguide.
Fig. 2
Fig. 2 Optical models of SSCs with SiO2 spacer utilizing the (a) knife-edge taper and (b) standard inverted taper. The graphs show the color-plotted dependence of mode conversion efficiency of these SSCs as a function of the SiO2 spacer thickness and the Si taper length for quasi-TE and TM modes, respectively. The dashed lines denote mode conversion efficiency above 98% for both the quasi-TE and TM modes.
Fig. 3
Fig. 3 Top: Schematic drawing of top and side views of of the SSC with SiO2 spacer. Middle: TEM images of cross-section of the SSC with the SiO2 spacer located in the (a) untapered region of Si wire waveguide; wu = 421 nm, wb = 558 nm, and h = 218 nm, (b) middle of the taper; wu = 147 nm, wb = 291 nm, and h = 218 nm, (c) near the tip; wb = 114 nm, and h = 169 nm, and (d) very near the tip ; wb = 49 nm, and h = 72 nm. Bottom: Calculated distribution of Poynting vectors along the propagating direction for each cross section.
Fig. 4
Fig. 4 Measured transmittance spectra of the Si wire waveguides terminated with SSC with and without a SiO2 spacer for quasi-TE and TM modes.
Fig. 5
Fig. 5 Measured transmittances of the Si waveguide terminated with SSC with and without SiO2 spacer as a function of waveguide length for quasi-TE and TM modes, respectively.

Tables (1)

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Table 1 Summary of fiber-to-chip coupling loss of the SSC with SiO2 spacer.

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